NBS Special Publication, Issues 400-421U.S. Government Printing Office, 1918 |
From inside the book
Results 1-5 of 93
Page 4
... limit used in evaluating a spectroscopy . These definitions are illus- trated in figure 2 for a typical impurity ... limit is a concept which is related to the sensitivity . The detection limit is defined as the minimum concentra- tion ...
... limit used in evaluating a spectroscopy . These definitions are illus- trated in figure 2 for a typical impurity ... limit is a concept which is related to the sensitivity . The detection limit is defined as the minimum concentra- tion ...
Page 5
... limits and to speak of volumetric concentrations . It follows that those surface analytical techniques employing the smallest sampling depths are capable of yielding concentration profiles displaying the greatest depth resolution and ...
... limits and to speak of volumetric concentrations . It follows that those surface analytical techniques employing the smallest sampling depths are capable of yielding concentration profiles displaying the greatest depth resolution and ...
Page 6
... limit , minimum detectable impurity level and background are illustrated for a typical impurity calibration curve . T AN SENSITIVITY = TAN α = ΔΕ 3√NB Ng Lo Lo MATERIAL CONCENTRATION , C = DETECTION LIMIT NMIN MINIMUM DETECTABLE ...
... limit , minimum detectable impurity level and background are illustrated for a typical impurity calibration curve . T AN SENSITIVITY = TAN α = ΔΕ 3√NB Ng Lo Lo MATERIAL CONCENTRATION , C = DETECTION LIMIT NMIN MINIMUM DETECTABLE ...
Page 23
... limit of depth resolution by this technique is on the order of 200 Å , so that only integrated values over these thicknesses can be obtained , and thus the data can only infer the Si - rich interface . The low energy scattering ...
... limit of depth resolution by this technique is on the order of 200 Å , so that only integrated values over these thicknesses can be obtained , and thus the data can only infer the Si - rich interface . The low energy scattering ...
Page 45
... limit the usefulness of the technique and describes methods to minimize them . These effects have been summarized in Table I. DEPTH RESOLUTION To achieve good depth resolution it is ob- vious that the surface of the crater bottom must ...
... limit the usefulness of the technique and describes methods to minimize them . These effects have been summarized in Table I. DEPTH RESOLUTION To achieve good depth resolution it is ob- vious that the surface of the crater bottom must ...
Common terms and phrases
aluminum Analysis for Silicon analyzed angstroms ARPA/NBS Workshop atoms Auger electron Auger electron spectroscopy Auger transition backscattering backside base binding energy bombardment boron Bureau of Standards chemical chemical shift collector resistivity concentration curve depth profile detector diffused dopant density effect electron beam emitter ESCA escape depth etched field plate film function gold impurity integrated circuit interface ion beam laser layer measurement metal MOS capacitor n-p-n transistor National Bureau obtained optical oxygen p-n junctions particles peak photoelectron Phys primary beam primary ion probe protons region resistor VDP resonance sample scanner scanning scattering semiconductor sensitivity sheet resistor shown in Figure signal Silicon Devices silicon nitride silicon oxides silicon surface SIMS SiO2 sodium specimen spectra spectrometer spectroscopy spectrum sputtering stoichiometry substrate Surface Analysis surface photovoltage technique Technology test structures thermal thickness tion transistor voltage wafer width X-ray yield yield curve
Popular passages
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Page 64 - Papers of interest primarily to scientists working in these fields. This section covers a broad range of physical and chemical research, with major emphasis on standards of physical measurement, fundamental constants, and properties of matter. Issued six times a year. Annual subscription: Domestic, $9.50; foreign, $11.75*.
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Page 35 - Standards, the Institute for Materials Research, the Institute for Applied Technology, the Institute for Computer Sciences and Technology, and the Office for Information Programs. THE INSTITUTE FOR BASIC STANDARDS provides the central basis within the United States of a complete and consistent system of physical measurement; coordinates that system with measurement systems of other nations; and furnishes essential services leading to accurate and uniform physical measurements throughout the Nation's...
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