Figure 2. Complexity of silicon integrated circuits over the time period 1959-1975 (G. E. Moore, Ref. 1). Figure 1. Representative cross-sections of two main types of semiconductor device structures. Oxygen/Silicon Figure 3. Kinetics of the thermal oxidation of silicon, including the general relationship. 2.2 2.0 1.8 4 1.25 10 Figure 4. Ratio of oxygen to silicon vs. oxide thickness for thermal and anodic films (Sigmon et al., Ref. 4). 3 (a) |