NATIONAL BUREAU OF STANDARDS The National Bureau of Standards' was established by an act of Congress March 3, 1901. The Bureau's overall goal is to strengthen and advance the Nation's science and technology and facilitate their effective application for public benefit. To this end, the Bureau conducts research and provides: (1) a basis for the Nation's physical measurement system, (2) scientific and technological services for industry and government, (3) a technical basis for equity in trade, and (4) technical services to promote public safety. The Bureau consists of the Institute for Basic Standards, the Institute for Materials Research, the Institute for Applied Technology, the Institute for Computer Sciences and Technology, and the Office for Information Programs. THE INSTITUTE FOR BASIC STANDARDS provides the central basis within the United States of a complete and consistent system of physical measurement; coordinates that system with measurement systems of other nations; and furnishes essential services leading to accurate and uniform physical measurements throughout the Nation's scientific community, industry, and commerce. The Institute consists of the Office of Measurement Services, the Office of Radiation Measurement and the following Center and divisions: Applied Mathematics Electricity Mechanics Heat Optical Physics Center Laboratory Astrophysics" THE INSTITUTE FOR MATERIALS RESEARCH conducts materials research leading to improved methods of measurement, standards, and data on the properties of well-characterized materials needed by industry, commerce, educational institutions, and Government; provides advisory and research services to other Government agencies; and develops, produces, and distributes standard reference materials. The Institute consists of the Office of Standard Reference Materials, the Office of Air and Water Measurement, and the following divisions: Analytical Chemistry Polymers Reactor Inorganic Materials Radiation Physical Chemistry. Metallurgy THE INSTITUTE FOR APPLIED TECHNOLOGY provides technical services to promote the use of available technology and to facilitate technological innovation in industry and Government; cooperates with public and private organizations leading to the development of technological standards (including mandatory safety standards), codes and methods of test; and provides technical advice and services to Government agencies upon request. The Institute consists of the following divisions and Centers: Standards Application and Analysis Electronic Technology Center for Consumer Product Technology: Product Systems Analysis; Product Engineering - Center for Building Technology: Structures, Materials, and Life Safety: Building Environment; Technical Evaluation and Application - Center for Fire Research: Fire Science; Fire Safety Engineering. THE INSTITUTE FOR COMPUTER SCIENCES AND TECHNOLOGY conducts research and provides technical services designed to aid Government agencies in improving cost effectiveness in the conduct of their programs through the selection, acquisition, and effective utilization of automatic data processing equipment; and serves as the principal focus within the executive branch for the development of Federal standards for automatic data processing equipment, techniques, and computer languages. The Institute consists of the following divisions: Computer Services Systems and Software tion Technology. Computer Systems Engineering - Informa THE OFFICE FOR INFORMATION PROGRAMS promotes optimum dissemination and accessibility of scientific information generated within NBS and other agencies of the Federal Government; promotes the development of the National Standard Reference Data System and a system of information analysis centers dealing with the broader aspects of the National Measurement System; provides appropriate services to ensure that the NBS staff has optimum accessibility to the scientific information of the world. The Office consists of the following organizational units: Office of Standard Reference Data - Office of Information Activities - Office of Technical Publications Library Office of International Relations Office of International Standards. 1 Headquarters and Laboratories at Gaithersburg, Maryland, unless otherwise noted; mailing address Washington, DC. 20234. Located at Boulder, Colorado 80302. Semiconductor Measurement Technology: Surface Analysis for Silicon Devices U.S. DEPARTMENT OF COMMERCE, Elliot L. Richardson, Secretary Dr. Betsy Ancker-Johnson, Assistant Secretary for Science and Technology Issued March 1976 Library of Congress Cataloging in Publication Data ARPA/NBS workshop IV. (Semiconductor measurement technology) (NBS Special publication; 400-23) "Contains the proceedings of the ARPA/NBS workshop IV, Surface analysis for silicon devices, held at the National Bureau of Standards on April 23-24, 1975." Supt. of Docs. no.: C 13.10:400-23. 1. Semiconductors-Testing-Congresses. 2. Silicon- 400-23 [TK7871.85] 602'.1s [621.3815'2] National Bureau of Standards Special Publication 400-23 Nat. Bur. Stand. (U.S.), Spec. Publ. 400-23,238 pages (Mar. 1976) CODEN: XNBSAV PREFACE The ARPA/NBS Workshop IV, Surface Analysis for Silicon Devices, was held at the National Bureau of Standards on April 23-24, 1975 under the cosponsorship of the National Bureau of Standards and the Defense Advanced Research Projects Agency. It was the first meeting, on a national level, to address the applicability of modern surface measurement techniques to the analysis of semiconductor devices. Representatives from industrial, governmental and academic organizations concerned with device manufacture, analysis and instrument design participated in this workshop. Speakers were selected from among the finest and most active researchers in the field. The outcome was a large and enthusiastic workshop attendance. It is hoped that this report will convey the spirit of the workshop to those who could not attend. A. George Lieberman ABSTRACT This report contains the proceedings of the ARPA/NBS Workshop IV, Surface Analysis for Silicon Devices, held at the National Bureau of Standards on April 23-24, 1975. The Workshop, as part of an NBS program to develop measurement technology for the field of semiconductor devices, was held to discuss the present capabilities and future prospects of modern analytical beam techniques as applied to silicon, and associated insulator films and device structures. Of particular interest were the determination of impurity profiles, surface contamination, and interface characteristics. Techniques utilizing impinging electron, ion, neutral or photon beams were considered. The Workshop was directed at the analysts, the semiconductor manufacturers who use the analysts' results, and the instrument people who design and manufacture the analytical equipment. Transcripts of the discussions following each paper are also included within these proceedings. Key words: Auger spectroscopy; depth profiles; electron beam induced imaging; ESCA; insulator films; interface characteristics; internal photoemission; ion scattering spectroscopy; nuclear resonance profiling; photodepopulation; photovoltaic imaging; Rutherford backscattering; SCANIIR; secondary ion mass spectroscopy; semiconductor devices; silicon; surface analysis; X-ray photoelectron spectroscopy. |