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Page 16
They can be broadly classified into physical vapour deposition ( PVD ) and chemical vapour deposition ( CVD ) 3.4.1 Physical Vapour Deposition ( PVD ) Principles Materials are deposited onto a substrate from a source in a high vacuum ...
They can be broadly classified into physical vapour deposition ( PVD ) and chemical vapour deposition ( CVD ) 3.4.1 Physical Vapour Deposition ( PVD ) Principles Materials are deposited onto a substrate from a source in a high vacuum ...
Page 21
The high process temperature ( 800-1000 ° C ) often necessitate a postcoating heat treatment of the substrate . This may result in either cracking of the coating or distortion of the component . Appropriate substrate material selection ...
The high process temperature ( 800-1000 ° C ) often necessitate a postcoating heat treatment of the substrate . This may result in either cracking of the coating or distortion of the component . Appropriate substrate material selection ...
Page 27
More powerful lasers , and development of specific lasers ( wavelength ) for specific substrate materials . 3.6 . Diffusion Methods Principles Diffusion methods produce coatings by interdiffusion of coating elements and substrate .
More powerful lasers , and development of specific lasers ( wavelength ) for specific substrate materials . 3.6 . Diffusion Methods Principles Diffusion methods produce coatings by interdiffusion of coating elements and substrate .
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